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Superhard NbB2 −x thin films deposited by dc magnetron sputtering

机译:直流磁控溅射沉积超硬NbB2 -x薄膜

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摘要

We have deposited weakly textured substoichiometric NbB2-x thin films by magnetron sputtering from an NbB2 target. The films exhibit superhardness (42 +/- 4 GPa), previously only observed in overstoichiometric TiB2 thin films, and explained by a self-organized nanostructuring, where thin TiB2 columnar grains hinder nucleation and slip of dislocations and a B-rich tissue phase between the grains prevent grain-boundary sliding. The wide homogeneity range for the NbB2 phase allows a similar ultra-thin B-rich tissue phase to form between thin (5-10 nm) columnar NbB2-x grains also for films with a B/Nb atomic ratio of 1.8, as revealed here by analytical aberration-corrected scanning transmission electron microscopy. Furthermore, a coefficient of friction of 0.16 is measured for an NbB2-x film sliding against stainless steel with a wear rate of 5 x 10(-7) mm(3)/Nm. X-ray photoelectron spectroscopy results suggest that the low friction is due to the formation of a lubricating boric acid film.
机译:我们已经通过磁控溅射从NbB2靶上沉积了质地较弱的亚化学计量的NbB2-x薄膜。膜表现出超硬性(42 +/- 4 GPa),以前仅在化学计量过剩的TiB2薄膜中观察到,并由自组织纳米结构解释,其中薄的TiB2柱状晶粒阻碍了位错的成核和错位以及B之间的富B组织相。晶粒阻止了晶界的滑动。 NbB2相的宽均匀性范围允许在B / Nb原子比为1.8的薄膜(5-10 nm)柱状NbB2-x晶粒之间形成相似的超薄富B组织相,如此处所示通过分析像差校正的扫描透射电子显微镜。此外,对于在不锈钢上滑动的NbB2-x膜,其磨损率为5 x 10(-7)mm(3)/ Nm,测得的摩擦系数为0.16。 X射线光电子能谱的结果表明,低摩擦是由于润滑性硼酸膜的形成。

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